plasma sputtering meaning in Chinese
等离子溅射
Examples
- Plasma sputtering equipment
等离子溅射设备 - The applications field of fgm include aerospace , electron , chemistry , biology and medicine fields ; the composition change also from metal / ceramic to metal / metal , metal / alloy , non - metal / non - metal and non - metal / ceramic . moreover , various methods including powder metallurgy , self - propagating high - temperature synthesis ( shs ) , chemical and physical vapor deposition ( cvd and pvd ) , electrodeposition , laser cladding method , plasma sputtering and sol - gel method have been studed . metal organic chemical vapor deposition ( mocvd ) , using chemical vapor deposition of metal organic compounds , is an effective method for acquiring special function materials and membrane
功能梯度材料是21世纪最有发展前景的新型材料之一，其用途已由原来的宇航工业，扩大到核能源、电子、化学、生物医学等领域；其组成也由金属?陶瓷发展成为金属?金属、金属?合金、非金属?非金属、非金属?陶瓷等多种组合；其制备方法主要包括粉末冶金法，自蔓延高温合成法( shs ) 、气相沉积法( cvd和pvd ) 、电沉积法，激光熔覆法，溶胶?凝胶法( sol - gel )等。